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翻訳と辞書　辞書検索 [ 開発暫定版 ] スポンサード リンク Physical vapor deposition ： ウィキペディア英語版 Physical vapor deposition Physical vapor deposition (PVD) describes a variety of vacuum deposition methods which can be used to produce thin films. PVD uses physical process (such as heating or sputtering) to produce a vapor of material, which is then deposited on the object which requires coating. PVD is used in the manufacture of items which require thin films for mechanical, optical, chemical or electronic functions. Examples include semiconductor devices such as thin film solar panels, aluminized PET film for food packaging and balloons,〔Hanlon, J. (1992). 1st ed. ''Handbook of Package Engineering'', Lancaster, PA, Technomic Publishing: ISBN 0-87762-924-2. Chapter 4 Coatings and Laminations〕 and coated cutting tools for metalworking. Besides PVD tools for fabrication, special smaller tools (mainly for scientific purposes) have been developed. Common industrial coatings applied by PVD are titanium nitride, zirconium nitride, chromium nitride, titanium aluminum nitride.〔http://www.coatingservicesgroup.com〕 The source material is unavoidably also deposited on most other surfaces interior to the vacuum chamber, including the fixturing used to hold the parts. == Examples == * Cathodic Arc Deposition: In which a high-power electric arc discharged at the target (source) material blasts away some into highly ionized vapor to be deposited onto the workpiece. * Electron beam physical vapor deposition: In which the material to be deposited is heated to a high vapor pressure by electron bombardment in "high" vacuum and is transported by diffusion to be deposited by condensation on the (cooler) workpiece. * Evaporative deposition: In which the material to be deposited is heated to a high vapor pressure by electrical resistance heating in "high" vacuum. * Pulsed laser deposition: In which a high-power laser ablates material from the target into a vapor. * Sputter deposition: In which a glow plasma discharge (usually localized around the "target" by a magnet) bombards the material sputtering some away as a vapor for subsequent deposition. Various thin film characterisation techniques can be used to measure the physical properties of PVD coatings, such as: * Calo tester: coating thickness test * Nanoindentation: hardness test for thin-film coatings * Pin on disc tester: wear and friction coefficient test * Scratch tester: coating adhesion test * X-ray micro-analyzer: investigation of structural features and heterogeneity of elemental composition for the growth surfaces 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Physical vapor deposition」の詳細全文を読む スポンサード リンク 翻訳と辞書 : 翻訳のためのインターネットリソース Copyright(C) kotoba.ne.jp 1997-2016. All Rights Reserved.